The 3IT facility is a cutting-edge research and innovation hub designed to support the development of advanced technologies from fundamental discovery to industrial application. It houses cleanrooms for micro- and nanofabrication, laboratories for materials growth and characterization, and specialized equipment for optoelectronics, photonics, and energy systems. With tools ranging from epitaxy and chemical vapor deposition to electron microscopy and device prototyping, 3IT provides researchers and partners with a complete platform to design, build, and test next-generation technologies. This unique infrastructure fosters interdisciplinary collaboration and accelerates the transition of innovative ideas into real-world solutions.
Laboratory and Equipements
Our laboratory uses the facilities of the Interdisciplinary Institute for Technological Innovation of university of Sherbrooke.
Here is a list of the main tools we are using to produce our materials.
- GSMBE / CBE reactor for III-V material
- CBE reactor for GaN materials
- CVD for group IV epitaxy
- Electrochemical porosification wet bench
- Materials structural characterization
- Materials and Device charaterization
- Access to 1600 m2 of class 100 clean room for device processing
III-Nitrides epitaxy reactor Epitaxy reactor III-V and IV materials
CVD reactor for SiGeSnC and graphene epitaxy Glove Box
XRD Rigaku
Porosification cell
